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Advanced-level - FOM alphaSC

FOM Technologies

The FOM alphaSC represents the ultimate combination of control, functionality, and versatility in thin-film research and production. All elements of its hardware, software and premium features have been tailored to eliminate experimental error and increase usability with both flexible and rigid substrates. The FOM alphaSC provides users with unmatched versatility, precision, and process reproducibility for a wide spectrum of lab-scale materials and coating processes relevant to industry and academia.

Features and benefits:

  • Microporous vacuum chuck with enabled uniform heating
  • Motorized, high-precision chuck motion system (10 µm steps)
  • Motorized, high-precision gantry motion system (10 µm steps)
  • External quick-control box for manual operation
  • Seamless glovebox integration
  • Fully automated deposition recipe capabilities
  • Integrated oven upgrade available
  • Roll-to-roll processing compatible
  • Temperature controlled syringe pump
  • Heated slot-dies range from ambient to 80 degrees celsius
  • Drying options (IR, UV, hot air, nitrogen flush air knife)
  • Large vacuum chuck area from A4 and up

Flowless automation and lab-to-fab approach.

The incorporation of a microporous substrate holder will provide homogeneous suction avoiding extra steps that are typically done to fixate the sample into the substrate. Together with the software-integrated pump, and the automated vertical and lateral movement of the slot-die head, the FOM alphaSC will allow for high throughput, highly systematic experimental design with an accelerated workflow. Post-deposition treatment units such as drying/annealing, compressed gas for quick-drying and docking modules can be added to the stand-alone FOM alphaSC tool to become a small-scale pilot processing line. The FOM alphaSC tool is well equipped for boosting the technology readiness level of your research and demonstrating proof of concepts from lab to fab.

Reproducibility and high precision

The software features the possibility for the generation of a protocol library allowing to call back and reproduce a deposition process with high precision giving the researcher an insight into the variables of the coating process.

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